We saw that during deposition, it is not possible to deposit a material only in…

Dopant redistribution:  The doped silicon is oxidized in some places, as part of the process sequence.…

A plot of the concentration profile (normalized with respect to Cs) , at various times,…

Collimated and Ionized Metal Plasma (IMP): There are some more advanced techniques in the PVD. One…

In this chapter we will see various deposition techniques that are used in microelectronic fabrication.…

In semiconductor manufacturing the term “oxidation” is used to refer the conversion of silicon to…

 Why are the neutral atoms removed from the beam just before deposition? The total quantity…

We saw that material can be deposited on the silicon wafer by various techniques such as PVD,…

In the previous chapter, we saw that the silicon should be changed to “N” type…

Etching PCB is to use the materials of chemical reactions or physical impact of technologies…